Polymeric Photocatalysts Based on Graphitic Carbon Nitride
Shaowen Cao, Jingxiang Low, Jiaguo Yu, Mietek Jaroniec
Advanced Materials · 2015 · 3,697 citations
Abstract
Semiconductor-based photocatalysis is considered to be an attractive way for solving the worldwide energy shortage and environmental pollution issues. Since the pioneering work in 2009 on graphitic carbon nitride (g-C3N4) for visible-light photocatalytic water splitting, g-C3N4 -based photocatalysis has become a very hot research topic. This review summarizes the recent progress regarding the design and preparation of g-C3N4 -based photocatalysts, including the fabrication and nanostructure design of pristine g-C3N4 , bandgap engineering through atomic-level doping and molecular-level modification, and the preparation of g-C3N4 -based semiconductor composites. Also, the photo-catalytic applications of g-C3N4 -based photocatalysts in the fields of water splitting, CO2 reduction, pollutant degradation, organic syntheses, and bacterial disinfection are reviewed, with emphasis on photocatalysis promoted by carbon materials, non-noble-metal cocatalysts, and Z-scheme heterojunctions. Finally, the concluding remarks are presented and some perspectives regarding the future development of g-C3N4 -based photocatalysts are highlighted.
Cite this paper
Cao, S., Low, J., Yu, J., & Jaroniec, M. (2015). Polymeric photocatalysts based on graphitic carbon nitride. Advanced Materials, 27(13), 2150–2176. https://doi.org/10.1002/adma.201500033
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