Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition
Alfonso Reina, Xiaoting Jia, John Ho, Daniel Nezich, Hyungbin Son, Vladimir Bulović, M. S. Dresselhaus, Jing Kong
Nano Letters · 2008 · 5,914 citations
Abstract
In this work we present a low cost and scalable technique, via ambient pressure chemical vapor deposition (CVD) on polycrystalline Ni films, to fabricate large area ( approximately cm2) films of single- to few-layer graphene and to transfer the films to nonspecific substrates. These films consist of regions of 1 to approximately 12 graphene layers. Single- or bilayer regions can be up to 20 mum in lateral size. The films are continuous over the entire area and can be patterned lithographically or by prepatterning the underlying Ni film. The transparency, conductivity, and ambipolar transfer characteristics of the films suggest their potential as another materials candidate for electronics and opto-electronic applications.
Cite this paper
Reina, A., Jia, X., Ho, J., Nezich, D., Son, H., Bulović, V., Dresselhaus, M. S., & Kong, J. (2008). Large area, few-layer graphene films on arbitrary substrates by chemical vapor deposition. Nano Letters, 9(1), 30–35. https://doi.org/10.1021/nl801827v
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