Riikka L. Puurunen
IMEC
1 paper in the Anchorcite directory, published in 2005, cited 2,632 times in total.
ORCID profileResearch topics
- Catalytic Processes in Materials Science · 1 paper
- Electronic and Structural Properties of Oxides · 1 paper
- Semiconductor materials and devices · 1 paper
Papers
- Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water processJournal of Applied Physics · 2005 · 2,632 citations
Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential self-terminating gas–solid reactions, has for about four decades been applied for manufacturing conformal inorganic material layers with thickness down to the nanometer range. Despite the numerous successful applications…
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